Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
表中的内容
1 Introduction.- Directions in Nanofabrication.- 2 Nanolithography.- Fundamentals of Electron Beam Exposure and Development.- Simulation of Electron Beam Exposure and Resist Processing for Nano-Patterning.- Helium Ion Lithography.- Nanoimprint Technologies.- 3 Deposition at the Nanoscale.- Atomic Layer Deposition for Nanotechnology.- Surface Functionalization in the Nanoscale Domain.- Nanostructures Based on Self-Assembly of Block Copolymers.- Epitaxial Growth of Metals on Semiconductors Via Electrodeposition.- 4 Nanoscale Etching and Patterning.- Chemical Mechanical Polish for Nanotechnology.- Deposition, Milling, and Etching with a Focused Helium Ion Beam.- Laser Nanopatterning.- Templating and Pattern Transfer Using Anodized Nanoporous Alumina/Titania.-
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